Lamination apparatus and lamination method using the same

ABSTRACT

The present invention is directed to a lamination apparatus and a lamination method using the same. The lamination apparatus includes a process chamber and a pump connected with one side of the process chamber for making the interior of the process chamber a vacuum. Inside the process chamber, a first and a second supply unit, an injection unit, and a bonding unit are provided. The first and the second supply units supply a first and a second metal sheet, respectively. The injection unit injects a bonding material between the first and the second metal sheets supplied, and the bonding unit bonds the first and the second metal sheets with each other. According to the present invention, a bonding force of the bonding material may be enhanced and various kinds of bonding materials may be used.

CROSS-REFERENCE TO RELATED APPLICATIONS

This U.S. non-provisional patent application claims priority under 35U.S.C § 119 from Korean Patent Application 2005-81099 filed on Sep. 1,2005, the entire contents of which are herein incorporated by reference.

BACKGROUND OF THE INVENTION

The present invention relates to a bonding apparatus and, moreparticularly, to a lamination apparatus and a lamination method usingthe same.

Generally, metal sheets are bonded by means of brazing, soldering,plasma welding or laser welding according to the kinds of metals.

Welding is wherein metal sheets are bonded by solidifying bondingsurfaces of the metal sheets after partially fusing the bondingsurfaces. Plasma welding or laser welding should be used to fully sealthe interior defined by the bonding. Unfortunately, plasma welding andlaser welding incur much higher costs than soldering. Namely, the plasmawelding and the laser welding have a low economical efficiency.

Soldering is wherein metal sheets are bonded by solidifying a bondingmaterial after fusing the bonding material having a lower fusing pointthan the metal sheets to flow between the metal sheets bonded by acapillary phenomenon. The soldering is performed at a temperature of 430degrees centigrade or lower. Unlike the soldering, brazing is performedat a temperature of 430 degrees or higher. Soldering and brazing areselectively applied according to the kinds of metal sheets.

When metal sheets are bonded by means of soldering, there is alimitation in selecting a bonding material because the bonding materialshould have a lower fusing point than the metal sheets. Further, bondingmaterials may be different in thickness and become porous to drop indensity. Since the soldering is performed in the air, the bondingmaterials are apt to be oxidized. For these reasons, bonding force of abonding material may diminish considerably.

SUMMARY OF THE INVENTION

Exemplary embodiments of the present invention are directed to alamination apparatus and a lamination method using the same. In anexemplary embodiment, the lamination apparatus may include a processchamber; a first supply unit and a second supply unit disposed insidethe process chamber for supplying a first and a second metal sheet,respectively; an injection unit for injecting a bonding material betweenthe first and the second metal sheets supplied; a bonding unit forbonding the first and the second metal sheets with each other; and apump connected to one side of the process chamber for making theinterior of the process chamber a vacuum.

In an exemplary embodiment, the lamination method may include making theinterior of a process chamber vacuum, the process chamber including afirst and a second metal sheet; supplying the first and the second metalsheets; injecting a bonding material between the first and the secondmetal sheets supplied; bonding the first and the second metal sheetswith each other; and heating the bonded metal sheets.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 illustrates a lamination apparatus according to the presentinvention.

FIG. 2 is a cross-sectional view when two lamination tapes are bonded bythe lamination apparatus according to the present invention.

FIG. 3 is a cross-sectional view of a metal lamination tape in which asuperconductive tape and a stabilization metal tape are bonded by meansof a conventional lamination method.

FIG. 4 is a cross-sectional view of a metal lamination tape in which asuperconductive tape and a stabilization metal tape are bonded by meansof a lamination method according to the present invention.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

The present invention will now be described more fully hereinafter withreference to the accompanying drawings, in which a preferred embodimentof the invention is shown. This invention, however, may be embodied inmany different forms and should not be construed as limited to theembodiments set forth herein. Rather, the embodiment is provided so thatthis disclosure will be thorough and complete, and will fully convey thescope of the invention to those skilled in the art. In the drawings, thethicknesses of elements are exaggerated for clarity. Like numbers referto like elements throughout.

A lamination apparatus according to the present invention is illustratedin FIG. 1. A first reel 21, a second reel 22, and a third reel 23 aredisposed inside a process chamber 10. A first metal lamination tape 1 twound on the first reel 21 is provided by rotation of the first reel 21,and a second metal lamination tape 2 t wound on the second reel 22 isprovided by rotation of the second reel 22.

A metal evaporator 30 injects metallic vapor that is a bonding material30 m between the first and second metal lamination tapes 1 t and 2 tprovided. The metal evaporator 30 includes a sealed housing 30 h and aninjection outlet 30 e. A metallic substance is introduced into thehousing 30 h through a sample slot (not shown) formed at the housing 30h and inert gas is introduced into the housing 30 h through a gas inlet(not shown). At this point, instead of inert gas, a metallic substancemay be injected thereinto after turning to a high-temperature vapor.Inside the housing 30 h, heating means (not shown) is provided forevaporating the metallic substance introduced into the housing 30 h. Theinert gas and evaporated metallic substance inside the housing 30 h areinjected fast through the injection outlet 30 e. A width of theinjection outlet 30 e may be equal to that of the first or second metallamination tape 1 t or 2 t. The evaporated metallic substance injectedbecomes the bonding material 30 m, bonding the first and second metallamination tapes 1 t and 2 t with each other. Metallic substances usedas bonding materials are, for example, silver (Ag), zinc (Zn), copper(Cu), lead (Pb) and so forth. A temperature controller 34 is connectedwith the heating means for constantly controlling a temperature of themetallic substance. A position adjuster 32 is connected with the bottomof the metal evaporator 30 for adjusting the position of the metalevaporator 30. In order to enhance a deposition efficiency of thebonding material 30 m, the injection outlet 30 e is maximally closelyadjacent to a bonding portion of the first and second metal laminationtapes 1 t and 2 t. In the metal evaporator 30, metal evaporation may bedone by heating using a heater or high-frequency induction heating.

A heat shielding film 36 may be provided between the metal evaporator 30and the metal lamination tapes 1 t and 2 t for preventing radiant heatof the metal evaporator 30 from excessively heating the metal laminationtapes t1 and t2. A bonding unit 25 enables the first and second metallamination tapes 1 t and 2 t to adhere closely and to be bonded witheach other, which is done by rotation of a roller.

The first and second metal lamination tapes are bonded with each other,constituting a metal lamination tape t3. The metal lamination tape t3 iswound on the third reel 23.

A heater 40 may be provided between the roller 25 and the third reel 23.The heater 40 may be one selected from the group consisting of ahigh-frequency induction heater, an infrared heater, and a halogenheater. The heater 40 may be installed inside the roller 25. The heater40 heats the metal lamination tape 3 t to enhance a bonding force. Theheating temperature is lower than a fusing point of the bonding material30 m.

A pump 50 is disposed at one side of the process chamber 10, making theinterior of the process chamber 10 a vacuum. Thus, the metallicsubstance evaporated by the metal evaporator 30 may be provided to abonding portion of the first and second metal lamination tapes 1 t and 2t without being oxidized. An adsorption sheet 55 may be provided betweenthe process chamber 10 and the pump 50. The adsorption sheet 55 adsorbsthe metallic vapor, i.e., the bonding material 30 m to prevent themetallic vapor from flowing into the pump 50.

FIG. 2 is a cross-sectional view when two metal lamination tapes arebonded by the lamination apparatus according to the present invention.

Referring to FIG. 2, a first metal lamination tape 1 t and a secondmetal lamination tape 2 t are bonded by means of a bonding material 30m. The bonding material 30 m sandwiched between the first and secondmetal lamination tapes 1 t and 2 t has a uniform thickness. Although notillustrated in this figure, the bonding material 30 m has a high densityand a fine structure.

FIG. 3 is a cross-sectional view of a metal lamination tape in which afirst metal lamination tape and a second lamination tape are bonded bymeans of a conventional lamination method. FIG. 4 is a cross-sectionalview of a metal lamination tape in which a first metal lamination tapeand a second metal lamination tape are bonded by means of a laminationmethod according to the present invention.

Referring to FIG. 3, a superconductive tape 11 t includes a substratefilm 11 t 1, a buffer film 11 t 2, a superconductive film 11 t 3, and aprotective film 11 t 4. The superconductive tape 11 t and astabilization metal tape 12 t are bonded by a bonding material 30 m. Thebuffer film 11 t 2 is made of a dielectric substance and sandwichedbetween the superconductive film 11 t 3 and the substrate film 11 t 1.Therefore, if overcurrent higher than critical current flows to thesuperconductive film 11 t 3, current flows through the stabilizationmetal tape 12 t to restrict a capacity for the overcurrent.

Referring to FIG. 4, a superconductive tape 21 t has the same structureas the conventional superconductive tape shown in FIG. 3. However, awidth of the superconductive tape 21 t is smaller than that of astabilization metal tape 22 t. Thus, if the superconductive tape 21 tand the stabilization metal tape 22 t are bonded by a bonding material30 m, the bonding material 30 m is deposited even on a side of thesuperconductive tape 21 t. Further, the bonding material 30 m maysurround the superconductive tape 21 t. Since the bonding material 30 mmade of a metal, i.e., has conductivity, a superconductive film 21 t 3may be electrically connected to a substrate film 21 t 1. This mayenable the overcurrent of the superconductive film 21 t 3 to be bypassedthrough the substrate film 21 t 1 and the stabilization metal tape 22 t.As a result, a capacity for the overcurrent may increase.

According to the present invention, vacuum deposition is conducted toeasily raise a temperature and gain a high vapor pressure in vacuum evenwhen a fusing point of a bonding material is high. Thus, laminationtapes are bonded using various kinds of bonding materials. Since a vaporpressure of a bonding material inside an injection unit is preciselycontrolled by a temperature controller, a constant deposition rate isobtained to make a thickness of the bonding material uniform. In thevacuum deposition, an element-state bonding material is injected fast tobe deposited. Therefore, a high-density bonding film is obtained. Sincethe vacuum deposition is conducted while reducing oxidation reactivegas, the possibility of oxidizing the bonding material is reduced. Evenwhen the oxidation reactive gas remains, a high vapor pressureestablished at a bonding portion of two lamination sheets prevents theoxidation reactive gas from flowing to the bonding portion. For thesereasons, a bonding force of the bonding material is enhanced. Inaddition, the cost of manufacturing and maintaining a laminationapparatus using the vacuum deposition is low. In a case where asuperconductive tape and a stabilization metal tape are bonded by meansof the lamination method according to the invention, the superconductivetape is electrically connected to a substrate film because theconductive bonding material is deposited on a side of thesuperconductive tape. Thus, overcurrent is bypassed through thesubstrate film and the stabilization metal tape to increase a capacityfor the overcurrent.

Although the present invention has been described in connection with theembodiment of the present invention illustrated in the accompanyingdrawings, it is not limited thereto. It will be apparent to thoseskilled in the art that various substitution, modifications and changesmay be thereto without departing from the scope and spirit of theinvention.

1. A lamination apparatus comprising: a process chamber; a first and asecond supply unit disposed inside the process chamber for supplying afirst and a second metal sheet, respectively; an injection unit forinjecting a bonding material between the first and the second metalsheets supplied; a bonding unit for bonding the first and the secondmetal sheets with each other; and a pump connected to one side of theprocess chamber for making the interior of the process chamber a vacuum.2. The lamination apparatus of claim 1, wherein the metal sheets aretape-type sheets, respectively; wherein the first and the second supplyunits are a first and a second reel, respectively; and wherein thetape-type first and second metal sheets are supplied by rotation of thefirst and second reels.
 3. The lamination apparatus of claim 2, whereinthe first and the second reels are different in width.
 4. The laminationapparatus of claim 2, wherein the bonding unit is a roller for rollingthe first and the second metal sheets to closely stick and bond the sameto each other.
 5. The lamination apparatus of claim 2, furthercomprising a third reel on which the metal sheets bonded by the bondingunit are wound.
 6. The lamination apparatus of claim 1, wherein thebonding unit bonds the first and the second metal sheets by closelysticking the same to each other.
 7. The lamination apparatus of claim 1,further comprising a heater for heating the metal sheets bonded by thebonding unit to enhance a bonding force of the first and the secondmetal sheets.
 8. The lamination apparatus of claim 7, wherein the heateris one selected from the group consisting of a high-frequency inductionheater, an infrared heater, and a halogen heater.
 9. The laminationapparatus of claim 7, wherein the heater is installed inside the bondingunit.
 10. The lamination apparatus of claim 1, wherein the injectionunit is a metal evaporator.
 11. The lamination apparatus of claim 1,wherein an injection outlet of the injection unit has the same width asthe first or the second metal sheet.
 12. The lamination apparatus ofclaim 1, further comprising a position adjuster for adjusting a positionof the injection unit relative to the bonding unit.
 13. The laminationapparatus of claim 1, further comprising a temperature controllerconnected with the injection unit for controlling a temperature of theinjection unit.
 14. The lamination apparatus of claim 1, furthercomprising a heat shielding film interposed between the first metalsheet and the injection unit and between the second metal sheet and theinjection unit.
 15. The lamination apparatus of claim 1, furthercomprising an adsorption sheet disposed between the process chamber andthe pump for adsorbing a vapor of the bonding material to prevent thebonding material from flowing into the pump.
 16. A lamination methodcomprising: making the interior of a process chamber a vacuum, theprocess chamber including a first and a second metal sheet; supplyingthe first and the second metal sheets; injecting a bonding materialbetween the first and the second metal sheets supplied; bonding thefirst and the second metal sheets with each other; and heating thebonded metal sheets.
 17. The lamination method of claim 16, wherein thefirst metal sheet is a superconductive tape, and the second metal sheetis a stabilization metal tape.
 18. The lamination method of claim 17,wherein a width of the superconductive tape is smaller than that of thestabilization metal tape.
 19. The lamination method of claim 18, whereinthe superconductive tape includes a protective film, a superconductivefilm, a buffer film, and a substrate film that are stacked in the ordernamed.
 20. The lamination method of claim 19, wherein the bondingmaterial surrounds the superconductive tape.
 21. The lamination methodof claim 17, wherein injection of the bonding material is done by meansof metallic evaporation.
 22. The lamination method of claim 21, whereinthe metallic evaporation is performed by heating using a heater orhigh-frequency induction heating.
 23. The lamination method of claim 17,wherein heating the bonded metal sheets is done by means of one selectedfrom the group consisting of high-frequency induction heating, infraredheating, and heating using a halogen heater.